Physico-chemical properties of silicon-carbon films obtained by electrochemical deposition

I.Y. Bogush, N.K. Plugotarenko ORCID logo , T.N. Myasoedova, V.V. Ptashnik show affiliations and emails
Received 05 September 2022; Accepted 18 November 2022;
Citation: I.Y. Bogush, N.K. Plugotarenko, T.N. Myasoedova, V.V. Ptashnik. Physico-chemical properties of silicon-carbon films obtained by electrochemical deposition. Lett. Mater., 2023, 13(1) 39-44
BibTex   https://doi.org/10.22226/2410-3535-2023-1-39-44

Abstract

Physico-chemical properties of silicon-carbon films obtained by electrochemical depositionPure silicon-carbon films and the films doped with manganese or nickel were deposited on a copper foil by the electrochemical method from a methanol / hexamethyldisilazane solution. Scanning electron microscopy studies of silicon-carbon films showed a complex structure due to the presence of three-dimensional agglomerates and “leafy” structures. Raman spectroscopy showed that the silicon-carbon films were highly defective. The porosity study revealed that all samples mostly contained mesopores with sizes of 10 – 50 nm. The nickel-containing samples showed a more stable bimodal distribution of the mesopores. The highest specific surface area was observed for the manganese-containing silicon carbon films.

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Funding

1. Southern Federal University - Strategic Academic Leadership Program of the Southern Federal University ("Priority 2030")